CVD

Minimize screen cracking and improve durability.
CVD system with improved quality of special film-coated products.

For the coating of special films on the surface of Silicon wafers, which are the material for semiconductors, CVD systems are generally used, and inside these systems are stainless steel screens. Conventional CVD systems vent shields or N2 shields have screens formed by an etching method, which are thin and frequently cracked due to thermal stress caused by repeated heating and cooling during use.

Replaced by our electron beam drilled screens, which allowed to increase the thickness of the plate with the same hole diameter, the occurrence of cracks is reduced. The quality of special film-coated products has been dramatically improved by using CVD systems that can be used for a long time.

※ The manufacturing (molding) of this product (N2 shield) has been stopped. Only screens designed for are available.